TY - GEN
AU - Thrun, Xaver
AU - Choi, Kang-Hoon
AU - Freitag, Martin
AU - Grenville, Andrew
AU - Gutsch, Manuela
AU - Hohle, Christoph
AU - Stowers, Jason K.
AU - Bartha, Johann W.
TI - Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography
PB - Elsevier BV
SN - 0167-9317
KW - Electrical and Electronic Engineering
KW - Surfaces, Coatings and Films
KW - Condensed Matter Physics
KW - Atomic and Molecular Physics, and Optics
KW - Electronic, Optical and Magnetic Materials
PY - 2012
ER -
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