TY -
GEN
AU - Kim, Jeong-Ho
AU - Yu, Jae-Seon
AU - Ku, Ja-Chun
AU - Ryu, Choon-Kun
AU - Oh, Su-Jin
AU - Kim, Si-Bum
AU - Kim, Jin-Woong
AU - Hwang, Jeong-Mo
AU - Lee, Su-Youb
AU - Kouichiro, Inazawa
TI -
Plasma enhanced chemical vapor deposition Si-rich silicon oxynitride films for advanced self-aligned contact oxide etching in sub-0.25 μm ultralarge scale integration technology and beyond
PB - American Vacuum Society
SN - 0734-2101
SN - 1520-8559
KW - Surfaces, Coatings and Films
KW - Surfaces and Interfaces
KW - Condensed Matter Physics
PY - 2000
UR - http://slubdd.de/katalog?TN_libero_mab2
ER -