TY - GEN
AU - Puthankovilakam, Krishnaparvathy
AU - Scharf, Toralf
AU - Kim, Myun Sik
AU - Naqavi, Ali
AU - Herzig, Hans Peter
AU - Weichelt, Tina
AU - Zeitner, Uwe
AU - Vogler, Uwe
AU - Voelkel, Reinhard
TI - Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy
PB - SPIE-Intl Soc Optical Eng
SN - 1932-5150
KW - Electrical and Electronic Engineering
KW - Mechanical Engineering
KW - Condensed Matter Physics
KW - Atomic and Molecular Physics, and Optics
KW - Electronic, Optical and Magnetic Materials
PY - 2016
UR - http://slubdd.de/katalog?TN_libero_mab2
ER -
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