author = { Hitchman, Michael L. AND Jensen, Klavs F. },

title = { Chemical vapour deposition Principles and applications },

publisher = {Academic Pr.},

isbn = {0123496705},

keywords = { Chemical vapor deposition , Plating , Aufsatzsammlung , CVD-Verfahren },

year = {1993},

abstract = {Includes bibliographical references and index},

address = { London [u.a.] },

url = { http://slubdd.de/katalog?TN_libero_mab2 }