author = { Puthankovilakam, Krishnaparvathy AND Scharf, Toralf AND Kim, Myun Sik AND Naqavi, Ali AND Herzig, Hans Peter AND Weichelt, Tina AND Zeitner, Uwe AND Vogler, Uwe AND Voelkel, Reinhard },

title = { Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy },

publisher = {SPIE-Intl Soc Optical Eng},

isbn = {1932-5150},

keywords = { Electrical and Electronic Engineering , Mechanical Engineering , Condensed Matter Physics , Atomic and Molecular Physics, and Optics , Electronic, Optical and Magnetic Materials },

year = {2016},

url = { http://slubdd.de/katalog?TN_libero_mab2 }