@misc
{TN_libero_mab2,
author = {
Dunbrack, Steven K.
AND
Muray, Andrew J.
AND
Sauer, Charles A.
AND
Lozes, Richard L.
AND
Nistler, John L.
AND
Arnold, William H.
AND
Kyser, David F.
AND
Minvielle, Anna Maria
AND
Preil, Moshe E.
AND
Singh, Bhanwar
AND
Templeton, Michael K.
},
title = {
Phase-shift mask technology: requirements for e-beam mask lithography
},
publisher = {SPIE},
isbn = {0277-786X},
year = {1991},
url = {
http://slubdd.de/katalog?TN_libero_mab2
}
}