@misc
{TN_libero_mab2,
author = {
Kudo, Takanori
AND
Lin, Guanyang
AND
Lee, Dongkwan
AND
Rahman, Dalil
AND
Timko, Allen
AND
Mckenzie, Douglas
AND
Anyadiegwu, Clement
AND
Chiu, Simon
AND
Houlihan, Frank
AND
Rentkiewicz, David
AND
Dammel, Ralph R.
AND
Padmanaban, Munirathna
AND
Biafore, John
},
title = {
Versatility in lithographic performance of advanced 193 nm contact hole resist
},
publisher = {SPIE},
isbn = {0277-786X},
year = {2006},
url = {
http://slubdd.de/katalog?TN_libero_mab2
}
}