author = { Thrun, Xaver AND Choi, Kang-Hoon AND Freitag, Martin AND Grenville, Andrew AND Gutsch, Manuela AND Hohle, Christoph AND Stowers, Jason K. AND Bartha, Johann W. },

title = { Demonstration of 22nm SRAM features with patternable hafnium oxide-based resist material using electron-beam lithography },

publisher = {SPIE},

isbn = {0277-786X},

year = {2012},

url = { http://slubdd.de/katalog?TN_libero_mab2 }