%0 Generic
%T Nickel silicide as a contact material for submicron CMOS devices
%A Chi, D. Z.
%A Mangelinck, D.
%A Zuruzi, A. S.
%A Wong, A. S. W.
%A Lahiri, S. K.
%I Springer Science and Business Media LLC
%@ 0361-5235
%@ 1543-186X
%K Materials Chemistry
%K Electrical and Electronic Engineering
%K Condensed Matter Physics
%K Electronic, Optical and Magnetic Materials
%D 2001
%C Springer Science and Business Media LLC
%U http://slubdd.de/katalog?TN_libero_mab2
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