%0 Generic
%T Process characterization with d.c. magnetron sputtering of CrSiC thin films in ArCH4 mixtures
%A Sobe, Gerhard
%A Neelmeijer, Antje
%A Weise, Günter
%A Heinrich, Armin
%I Elsevier BV
%@ 0040-6090
%K Materials Chemistry
%K Metals and Alloys
%K Surfaces, Coatings and Films
%K Surfaces and Interfaces
%K Electronic, Optical and Magnetic Materials
%D 1991
%C Elsevier BV
%U http://slubdd.de/katalog?TN_libero_mab2
Download citation