%0 Generic
%T The Etch Resistance of Electron Beam Resists in Chemical Dry Etching System Using Microwave Excitation
%A Jinno, Kiyokatsu
%I IOP Publishing
%@ 0021-4922
%@ 1347-4065
%K General Physics and Astronomy
%K Physics and Astronomy (miscellaneous)
%K General Engineering
%D 1978
%C IOP Publishing
%U http://slubdd.de/katalog?TN_libero_mab2
Download citation