%0 Generic
%T Toward controlled resist line-edge roughness: material origin of line-edge roughness in chemically amplified positive-tone resists
%A Lin, Qinghuang
%A Sooriyakumaran, Ratnam
%A Huang, Wu-Song
%I SPIE
%@ 0277-786X
%D 2000
%C SPIE
%U http://slubdd.de/katalog?TN_libero_mab2
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