%0 Generic
%T Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists
%A Fallica, Roberto
%A Nannarone, Stefano
%A Mahne, Nicola
%A Malvezzi, Andrea Marco
%A Berti, Andrea
%A Simone, Danilo De
%I Technical Association of Photopolymers, Japan
%@ 0914-9244
%@ 1349-6336
%K Materials Chemistry
%K Organic Chemistry
%K Polymers and Plastics
%D 2021
%C Technical Association of Photopolymers, Japan
%U http://slubdd.de/katalog?TN_libero_mab2
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