%0 Generic
%T Wetting Behavior of Plasma Etch Residue Removal Solutions on Plasma Damaged and Repaired Porous ULK Dielectrics
%A Ahner, Nicole
%A Zimmermann, Sven
%A Köhler, Nicole
%A Krüger, Stephan
%A Schulz, Stefan E.
%I Trans Tech Publications, Ltd.
%@ 1662-9779
%K Condensed Matter Physics
%K General Materials Science
%K Atomic and Molecular Physics, and Optics
%D 2014
%C Trans Tech Publications, Ltd.
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