%0
Book
%T
Investigation of physical and chemical interactions during etching of silicon in dual frequency capacitively coupled HBr/NF3 gas discharges
%A Reinicke, Marco
%I Books on Demand GmbH
%@ 9783839138441
%@ 3839138442
%K Hochschulschrift
%K Dynamisches RAM
%K Silicium
%K Wafer
%K Plasmaätzen
%K Gasentladung
%D 2009
%C Books on Demand GmbH
%C Norderstedt