%0
Generic
%T
New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm
%A Feiring, Andrew E.
%A Crawford, Michael K.
%A Farnham, William B.
%A Feldman, Jerald
%A French, Roger H.
%A Junk, Christopher P.
%A Leffew, Kenneth W.
%A Petrov, Viacheslav A.
%A Qiu, Weiming
%A Schadt, Frank L.
%A Tran, Hoang V.
%A Zumsteg, Fredrick C.
%I American Chemical Society (ACS)
%@ 0024-9297
%@ 1520-5835
%K Materials Chemistry
%K Inorganic Chemistry
%K Polymers and Plastics
%K Organic Chemistry
%D 2006
%C American Chemical Society (ACS)
%U http://slubdd.de/katalog?TN_libero_mab2