TY - GEN
AU - Prucker, Oswald
AU - Schimmel, Martin
AU - Tovar, Günter
AU - Knoll, Wolfgang
AU - Rühe, Jürgen
TI - Microstructuring of Molecularly Thin Polymer Layers by Photolithography
PB - Wiley
SN - 0935-9648
SN - 1521-4095
KW - Mechanical Engineering
KW - Mechanics of Materials
KW - General Materials Science
PY - 1998
UR - http://slubdd.de/katalog?TN_libero_mab2
ER -
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