TY - GEN
AU - Pelleg, Joshua
TI - Diffusion of phosphorus in TaSi2 thin films II: Lattice and short-circuit diffusion in TaSi2/SiO2
PB - Elsevier BV
SN - 0040-6090
KW - Materials Chemistry
KW - Metals and Alloys
KW - Surfaces, Coatings and Films
KW - Surfaces and Interfaces
KW - Electronic, Optical and Magnetic Materials
PY - 1983
UR - http://slubdd.de/katalog?TN_libero_mab2
ER -
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