TY - GEN

AU - Erdmann, Andreas

AU - Evanschitzky, Peter

AU - Neumann, Jens Timo

AU - Gräupner, Paul

TI - Mask-induced best-focus-shifts in DUV and EUV lithography

PB - SPIE

SN - 0277-786X

PY - 2015

UR - http://slubdd.de/katalog?TN_libero_mab2

ER -

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