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  1. Le Gouil, A.; Joubert, O.; Cunge, G.; Chevolleau, T.; Vallier, L.; Chenevier, B.; Matko, I.

    Poly-Si∕TiN∕HfO2 gate stack etching in high-density plasmas

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    American Vacuum Society, 2007

    Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena