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  1. Spring, Samuel [Author]

    Metal cleaning

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    London: Chapman & Hall, [1963] ; New York [u.a.]: Reinhold [u.a.], [1963]

  2. Rużyłło, Jerzy [Editor]; Novak, Richard E. [Other] ; International Symposium on Cleaning Technology in Semiconductor Device Manufacturing 2 1991 Phoenix, Ariz, Electrochemical Society Electronics Division, Electrochemical Society Dielectric Science and Technology Division

    Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing : [held at the Electrochemical Society Fall Meeting in Phoenix, Arizona, October 14 - 18, 1992 (i.e. 1991!)]

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    Pennington, NJ: Electrochemical Society, 1992

    Published in: Electrochemical Society: Proceedings volume ; 92,12

  3. Watson, Mark [Author]

    Eleven - [Paperback ed.]

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    London [u.a.]: Simon & Schuster, 2011

  4. Rużyłło, Jerzy [Other]; Novak, Richard E. [Other]; Ruzyllo, Jerzy [Editor] ; International Symposium on Cleaning Technology in Semiconductor Device Manufacturing 3 1993 New Orleans, La, Electrochemical Society, Electrochemical Society Electronics Division, Electrochemical Society Dielectric Science and Technology Division

    Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing : [held at the Electrochemical Society Fall Meeting in New Orleans, Louisiana, October 15 - 20, 1993]

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    Pennington, NJ: Electrochemical Society, 1994

    Published in: Electrochemical Society: Proceedings volume ; 19940700

  5. Joppa, Matthias [Author] ; Technische Universität Dresden

    Experimentell unterstützte Entwicklung eines Basismodells für die quantitative Vorhersage der Strahlreinigung in der Lebensmittelindustrie mithilfe numerischer Strömungssimulation

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    Dresden: TUDpress, 2021

    Published in: Technische Universität Dresden: Schriftenreihe aus dem Institut für Strömungsmechanik ; 33