Skip to contents

  10. Lin, Qinghuang; Simpson, Logan L.; Steinhaeusler, Thomas; Wilder, Michelle; Willson, C. Grant; Havard, Jennifer M.; Frechet, Jean M. J.

    Water-soluble resist for environmentally friendly lithography

    Conference Proceedings
    View online
    Schließen
    Close

    Bookmarks

    You can manage bookmarks using lists, please log in to your user account for this.

    SPIE, 1996

    Published in: Metrology, Inspection, and Process Control for Microlithography X

  12. Lin, Qinghuang; Black, Charles T.; Detavernier, Christophe; Gignac, Lynne; Guarini, Kathryn; Herbst, Brian; Kim, Hyungjun; Oldiges, Philip; Petrillo, Karen E.; Sanchez, Martha I.

    Does line-edge roughness matter?: FEOL and BEOL perspectives

    Conference Proceedings
    View online
    Schließen
    Close

    Bookmarks

    You can manage bookmarks using lists, please log in to your user account for this.

    SPIE, 2003

    Published in: Advances in Resist Technology and Processing XX

  15. Wang, Chao; Nam, Sung-Wook; Cotte, John M.; Jahnes, Christopher V.; Colgan, Evan G.; Bruce, Robert L.; Brink, Markus; Lofaro, Michael F.; Patel, Jyotica V.; Gignac, Lynne M.; Joseph, Eric A.; Rao, Satyavolu Papa; Stolovitzky, Gustavo; Polonsky, Stanislav; Lin, Qinghuang

    Wafer-scale integration of sacrificial nanofluidic chips for detecting and manipulating single DNA molecules

    Articles
    View online
    Schließen

    Access

    Close

    Bookmarks

    You can manage bookmarks using lists, please log in to your user account for this.

    Springer Science and Business Media LLC, 2017

    Published in: Nature Communications

  16. Wang, Chao; Bruce, Robert L.; Duch, Elizabeth A.; Patel, Jyotica V.; Smith, Joshua T.; Astier, Yann; Wunsch, Benjamin H.; Meshram, Siddharth; Galan, Armand; Scerbo, Chris; Pereira, Michael A.; Wang, Deqiang; Colgan, Evan G.; Lin, Qinghuang; Stolovitzky, Gustavo

    Hydrodynamics of Diamond-Shaped Gradient Nanopillar Arrays for Effective DNA Translocation into Nanochannels

    Articles
    View online
    Schließen

    Access

    Close

    Bookmarks

    You can manage bookmarks using lists, please log in to your user account for this.

    American Chemical Society (ACS), 2015

    Published in: ACS Nano

  17. Lin, Qinghuang; Nelson, A.; Bozano, L.; Brock, P.; Cohen, S.; Davis, B.; Kwong, R.; Liniger, E.; Neumayer, D.; Rathore, J. S.; Shobha, H.; Sooriyakumaran, R.; Purushothaman, S.; Miller, R.; Allen, R.; Spooner, T.; Wisnieff, R.

    Extending photo-patternable low-κ concept to 193nm lithography and e-beam lithography

    Conference Proceedings
    View online
    Schließen
    Close

    Bookmarks

    You can manage bookmarks using lists, please log in to your user account for this.

    SPIE, 2011

    Published in: SPIE Proceedings

  18. Lin, Qinghuang; Nelson, Alshakim; Chen, Shyng-Tsong; Brock, Philip; Cohen, Stephan A.; Davis, Blake; Kaplan, Richard; Kwong, Ranee; Liniger, Eric; Neumayer, Debra; Patel, Jyotica; Shobha, Hosadurga; Sooriyakumaran, Ratnam; Purushothaman, Sampath; Miller, Robert; Spooner, Terry; Wisnieff, Robert

    Integration of Photo-Patternable Low-κ Material into Advanced Cu Back-End-Of-The-Line

    Articles
    View online
    Schließen

    Access

    Close

    Bookmarks

    You can manage bookmarks using lists, please log in to your user account for this.

    IOP Publishing, 2010

    Published in: Japanese Journal of Applied Physics

  19. Lin, Qinghuang; Chen, S. T.; Nelson, A.; Brock, P.; Cohen, S.; Davis, B.; Fuller, N.; Kaplan, R.; Kwong, R.; Liniger, E.; Neumayer, D.; Patel, J.; Shobha, H.; Sooriyakumaran, R.; Purushothaman, S.; Spooner, T.; Miller, R.; Allen, R.; Wisnieff, R.

    Multilevel integration of patternable low-κ material into advanced Cu BEOL

    Conference Proceedings
    View online
    Schließen
    Close

    Bookmarks

    You can manage bookmarks using lists, please log in to your user account for this.

    SPIE, 2010

    Published in: SPIE Proceedings

  20. Huang, Wu-Song; Kwong, Ranee W.; Moreau, Wayne M.; Lang, Robert; Medeiros, David R.; Petrillo, Karen E.; Mahorowala, Arpan P.; Angelopoulos, Marie; Lin, Qinghuang; Dai, Junyan; Ober, Christopher K.

    Applicaton of blends and side chain Si-O copolymers as high-etch-resistant sub-100-nm e-beam resists

    Conference Proceedings
    View online
    Schließen
    Close

    Bookmarks

    You can manage bookmarks using lists, please log in to your user account for this.

    SPIE, 2002

    Published in: SPIE Proceedings