author = { Kremin, Christoph Hoffmann, Martin AND Schaaf, Peter AND Schnakenberg, Uwe },

title = { Fabrication and application of self-masked silicon nanostructures in deep reactive ion etching processes },

publisher = {Universitätsbibliothek Ilmenau},

keywords = { Industriechemikalie , Silicium , Plasmatechnik , Hochschulschrift },

year = {2010},

address = { Ilmenau },

url = { http://slubdd.de/katalog?TN_libero_mab2 }