author = { Dallorto, Stefano Rangelow, Ivo W. AND Schwartzberg, Adam AND Strehle, Steffen },

title = { Enabling control of matter at the atomic level: atomic layer deposition and fluorocarbon-based atomic layer etching },

publisher = {TU Ilmenau},

keywords = { Etching , Atomic layer deposition , Halbleitertechnologie },

year = {2020},

address = { Ilmenau },

url = { http://slubdd.de/katalog?TN_libero_mab2 }