author = { Landesman, Jean-Pierre AND Cassidy, Daniel T. AND Fouchier, Marc AND Pargon, Erwine AND Levallois, Christophe AND Mokhtari, Merwan AND Jimenez, Juan AND Torres, Alfredo },

title = { Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry },

publisher = {Springer Science and Business Media LLC},

isbn = {0361-5235},

isbn = {1543-186X},

keywords = { Materials Chemistry , Electrical and Electronic Engineering , Condensed Matter Physics , Electronic, Optical and Magnetic Materials },

year = {2018},

url = { http://slubdd.de/katalog?TN_libero_mab2 }