author = { Erdmann, Andreas AND Evanschitzky, Peter AND Neumann, Jens Timo AND Gräupner, Paul },

title = { Mask-induced best-focus-shifts in DUV and EUV lithography },

publisher = {SPIE},

isbn = {0277-786X},

year = {2015},

url = { http://slubdd.de/katalog?TN_libero_mab2 }