%0 Generic
%T Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry
%A Landesman, Jean-Pierre
%A Cassidy, Daniel T.
%A Fouchier, Marc
%A Pargon, Erwine
%A Levallois, Christophe
%A Mokhtari, Merwan
%A Jimenez, Juan
%A Torres, Alfredo
%I Springer Science and Business Media LLC
%@ 0361-5235
%@ 1543-186X
%K Materials Chemistry
%K Electrical and Electronic Engineering
%K Condensed Matter Physics
%K Electronic, Optical and Magnetic Materials
%D 2018
%C Springer Science and Business Media LLC
%U http://slubdd.de/katalog?TN_libero_mab2
Download citation