%0 Generic
%T Growth and characterization of AP-MOCVD iron doped titanium dioxide thin films
%A Gauthier, V.
%A Bourgeois, S.
%A Sibillot, P.
%A Maglione, M.
%A Sacilotti, M.
%I Elsevier BV
%@ 0040-6090
%K Materials Chemistry
%K Metals and Alloys
%K Surfaces, Coatings and Films
%K Surfaces and Interfaces
%K Electronic, Optical and Magnetic Materials
%D 1999
%C Elsevier BV
%U http://slubdd.de/katalog?TN_libero_mab2
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