%0 Generic
%T Qualification of a low-cost high-quality reticle process for 90-nm contact layers
%A Strozewski, Kirk J.
%A Perez, Joe
%A Carter, Rusty
%A Kiefer, Robert
%A Jackson, Curt
%A MacDonald, Susan
%A Kalk, Franklin
%I SPIE
%@ 0277-786X
%D 2004
%C SPIE
%U http://slubdd.de/katalog?TN_libero_mab2
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