%0
Generic
%T
Mask-induced best-focus-shifts in DUV and EUV lithography
%A
Erdmann, Andreas
%A
Evanschitzky, Peter
%A
Neumann, Jens Timo
%A
Gräupner, Paul
%I
SPIE
%@
0277-786X
%D
2015
%C
SPIE
%U
http://slubdd.de/katalog?TN_libero_mab2
Download citation