TY - GEN
AU - Kalpat, S.
AU - Hsing-Huang Tseng
AU - Ramon, M.
AU - Moosa, M.
AU - Tekleab, D.
AU - Tobin, P.J.
AU - Gilmer, D.C.
AU - Hegde, R.I.
AU - Capasso, C.
AU - Tracy, C.
AU - White, B.E.
TI - BTI characteristics and mechanisms of metal gated HfO/sub 2/ films with enhanced interface/bulk process treatments
PB - Institute of Electrical and Electronics Engineers (IEEE)
SN - 1530-4388
KW - Electrical and Electronic Engineering
KW - Safety, Risk, Reliability and Quality
KW - Electronic, Optical and Magnetic Materials
PY - 2005
UR - http://slubdd.de/katalog?TN_libero_mab2
ER -
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