%0 Generic
%T Design and performance of photoresist materials for ArF lithography
%A Kim, Hyun-Woo
%A Jung, Dong-Won
%A Lee, Sook
%A Choi, Sang-Jun
%A Woo, Sang-Gyun
%A Kavanagh, Robert J.
%A Barclay, George G.
%A Blacksmith, Robert F.
%A Kang, Doris
%A Pohlers, Gerd
%A Cameron, James F.
%A Mattia, Joe
%A Caporale, Stefan
%A Penniman, Thomas
%A Joesten, Lori A.
%A Thackeray, James W.
%I SPIE
%@ 0277-786X
%D 2001
%C SPIE
%U http://slubdd.de/katalog?TN_libero_mab2
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