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  3. Hillmann, Frank; Dobereiner, Stefan; Gittinger, Christian; Reiter, Richard; Falk, Gunther; Bruck, Hans-Jurgen; Scheuring, Gerd; Bosser, Artur; Heiden, Michael; Hoppen, Gerhard; Sulik, Wolfgang; Vollrath, Wolfgang

    DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI

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    SPIE, 2005

    Published in: SPIE Proceedings

  4. Hourd, Andrew C.; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Dobereiner, Stefan; Hillmann, Frank; Bruck, Hans-Jurgen; Hartmann, Hans; Ordynskyy, Volodymyr; Peter, Kai; Chen, Shiuh-Bin; Chen, Parkson W.; Jonckheere, Rik M.; Philipsen, Vicky; Schatz, Thomas; Sommer, Karl

    Implementation of 248-nm based CD metrology for advanced reticle production

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    SPIE, 2003

    Published in: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents