You can manage bookmarks using lists, please log in to your user account for this.
Media type:
Book;
Thesis
Title:
Investigation of physical and chemical interactions during etching of silicon in dual frequency capacitively coupled HBr/NF3 gas discharges
Other titles:
Übers. des Hauptsacht.: Untersuchung physikalischer und chemischer Wechselwirkungen beim Si-Ätzen in zweifrequenzangeregten kapazitiv gekoppelten HBr/NF3 Gasentladungen