Media type: Electronic Conference Proceeding Title: High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities Contributor: Khojasteh, Mahmoud; Chen, K. Rex; Kwong, Ranee W.; Lawson, Margaret C.; Varanasi, Pushkara R.; Patel, Kaushal S.; Kobayashi, Eiichi imprint: SPIE, 2003 Published in: Advances in Resist Technology and Processing XX Extent: Language: Not determined DOI: 10.1117/12.485126 ISSN: 0277-786X Origination: Footnote: