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Kodas, Toivo [Editor]

The chemistry of metal CVD

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Weinheim; New York; Basel; Cambridge; Tokyo: VCH, 1994
Hitchman, Michael L. [Editor]; Jensen, Klavs F. [Other]

Chemical vapour deposition : Principles and applications

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London [u.a.]: Academic Pr., 1993
Jones, Anthony C. [Editor]; Hitchman, Michael L. [Editor]

Chemical vapour deposition : precursors, processes and applications

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Cambridge: RSC Publishing, [2009]
Koizumi, Satoshi [Editor]

Physics and applications of CVD diamond

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Weinheim: Wiley-VCH-Verl., 2008
Fischer, Roland A. [Editor]; Allendorf, Mark D. [Other]

Precursor chemistry of advanced materials : CVD, ALD and nanoparticles

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Berlin; Heidelberg [u.a.]: Springer, 2005

Published in: Topics in organometallic chemistry ; 9
Emanuel, Mark A. [Author]

Metalorganic chemical vapor deposition for the heterostructure hot electron diode

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Park Ridge, N.J.: Noyes Data Corp., 1989
Pierson, Hugh O. [Author]

Handbook of chemical vapor deposition (CVD) : principles, technology, and applications - [ 2. ed. ]

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Norwich, NY: Noyes Publ., 1999
Yasuda, Hirotsugu K. [Author]; Yasuda, Hirotsugu [Author]

Luminous chemical vapor deposition and interface engineering

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New York, NY: Dekker, c2005

Published in: Surfactant science series ; 122
Sherman, Arthur [Author]

Chemical vapor deposition for microelectronics : Principles, technology, and applications

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Park Ridge, N.J.: Noyes Publ., 1987

Published in: Materials science and process technology series
Pinna, Nicola [Editor]; Knez, Mato [Other]

Atomic layer deposition of nanostructured materials

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Weinheim: Wiley-VCH, 2012
Konuma, Mitsuharu [Author]

Film deposition by plasma techniques : with 30 tables

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Berlin; Heidelberg [u.a.]: Springer, 1992

Published in: Springer series on atoms and plasmas ; 10
Lucovsky, Gerald [Editor]; Ibbotson, Dale E. [Editor]

Characterization of plasma-enhanced CVD processes : symposium held November 27 - 28, 1989, Boston, Masachusetts, U.S.A

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Pittsburgh, Pa.: Materials Research Soc., 1990

Published in: Materials Research Society: Materials Research Society symposium proceedings ; 16500
Jones, Anthony C. [Author]; O'Brien, Paul [Author]

CVD of compound semiconductors : precursor synthesis, development and applications

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Weinheim [u.a.]: VCH, 1997
Pelliccione, Matthew [Author]; Lu, Toh-Ming [Author]

Evolution of thin film morphology : modeling and simulations

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Berlin; Heidelberg: Springer, 2008

Published in: Springer series in materials science ; 108
Boyd, Ian W. [Editor] ; European Materials Research Society, Symposium on Photon, Beam and Plasma Assisted Processing Fundamentals and Device Technology 1988 Straßburg

Photon, beam and plasma assisted processing : proceedings of Symposium B on Photon, Beam and Plasma Assisted Processing Fundamentals and Device Technology of the 1988 E-MRS spring conference; Strasbourg, France, 31 May - 2 June 1988 - [ Reprint. ]

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Amsterdam [u.a.]: North-Holland, 1989

Published in: European Materials Research Society: European Materials Research Society symposia proceedings ; 2
Kulisch, Wilhelm [Author]

Deposition of diamond-like superhard materials

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Berlin; Heidelberg [u.a.]: Springer, 1999

Published in: Springer tracts in modern physics ; 157
Kodas, Toivo [Author]; Kodas, Toivo T. [Author]; Hampden-Smith, Mark J. [Author]

Aerosol processing of materials

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New York; Weinheim [u.a.]: Wiley, 1999
Sussmann, Ricardo S. [Editor]

CVD diamond for electronic devices and sensors - [ 1. publ. ]

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Chichester: Wiley, 2009

Published in: Wiley series in materials for electronic and optoelectronic applications
Puchalla, Jochen [Author]

Metallorganische Chemische Gasphasenabscheidung (MOCVD) ferroelektrischer Dünnschichten : Herstellung und Charakterisierung

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Jülich: Forschungszentrum, Zentralbibliothek, 2007

Published in: Forschungszentrum Jülich: Schriften des Forschungszentrums Jülich / Reihe Informationstechnik ; 17
Seshan, Krishna [Editor]

Handbook of thin-film deposition processes and techniques : principles, methods, equipment, and applications - [ 2. ed. ]

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Norwich, NY: Noyes Publ., c 2002

Published in: Materials science and processing technology series

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