Optimizing the Deposition of Hydrogen Evolution Sites on Suspended Semiconductor Particles using On‐Line Photocatalytic Reforming of Aqueous Methanol Solutions
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Medientyp:
E-Artikel
Titel:
Optimizing the Deposition of Hydrogen Evolution Sites on Suspended Semiconductor Particles using On‐Line Photocatalytic Reforming of Aqueous Methanol Solutions
Beteiligte:
Busser, G. Wilma;
Mei, Bastian;
Muhler, Martin
Beschreibung:
<jats:title>Abstract</jats:title><jats:p>The deposition of hydrogen evolution sites on photocatalysts is a crucial step in the multistep process of synthesizing a catalyst that is active for overall photocatalytic water splitting. An alternative approach to conventional photodeposition was developed, applying the photocatalytic reforming of aqueous methanol solutions to deposit metal particles on semiconductor materials such as Ga<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> and (Ga<jats:sub>0.6</jats:sub>Zn<jats:sub>0.4</jats:sub>)(N<jats:sub>0.6</jats:sub>O<jats:sub>0.4</jats:sub>). The method allows optimizing the loading of the co‐catalysts based on the stepwise addition of their precursors and the continuous online monitoring of the evolved hydrogen. Moreover, a synergetic effect between different co‐catalysts can be directly established.</jats:p>