Crawford, Michael K.;
Farnham, William B.;
Feiring, Andrew E.;
Feldman, Jerald;
French, Roger H.;
Leffew, Kenneth W.;
Petrov, Viacheslav A.;
Qiu, Weiming;
Schadt, Frank L.;
Tran, Hoang V.;
Wheland, Robert C.;
Zumsteg, Jr., Fredrick C.
Single layer fluropolymer resists for 157-nm lithography