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  1. Weber, Walter M.; Heinzig, Andre; Martin, Dominik; Slesazeck, Stefan; Mikolajick, Thomas

    Reconfigurable Nanowire Electronics

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    The Electrochemical Society, 2011

    Published in: ECS Meeting Abstracts

  2. Mulaosmanovic, Halid; Dunkel, Stefan; Kleimaier, Dominik; Kacimi, Amine el; Beyer, Sven; Breyer, Evelyn T.; Mikolajick, Thomas; Slesazeck, Stefan

    Effect of the Si Doping Content in HfO2 Film on the Key Performance Metrics of Ferroelectric FETs

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    Institute of Electrical and Electronics Engineers (IEEE), 2021

    Published in: IEEE Transactions on Electron Devices

  3. Breyer, Evelyn T.; Mulaosmanovic, Halid; Trommer, Jens; Melde, Thomas; Dunkel, Stefan; Trentzsch, Martin; Beyer, Sven; Slesazeck, Stefan; Mikolajick, Thomas

    Compact FeFET Circuit Building Blocks for Fast and Efficient Nonvolatile Logic-in-Memory

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    Institute of Electrical and Electronics Engineers (IEEE), 2020

    Published in: IEEE Journal of the Electron Devices Society

  4. Chohan, Talha; Zhao, Zhixing; Lehmann, Steffen; Arfaoui, Wafa; Bossu, Germain; Trommer, Jens; Slesazeck, Stefan; Mikolajick, Thomas; Siddabathula, Mahesh

    Implication of Self-Heating Effect on Device Reliability Characterization of Multi-Finger n-MOSFETs on 22FDSOI

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    Institute of Electrical and Electronics Engineers (IEEE), 2022

    Published in: IEEE Transactions on Device and Materials Reliability

  5. Hoffmann, Michael; Khan, Asif Islam; Serrao, Claudy; Lu, Zhongyuan; Salahuddin, Sayeef; Pešić, Milan; Slesazeck, Stefan; Schroeder, Uwe; Mikolajick, Thomas

    Ferroelectric negative capacitance domain dynamics

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    AIP Publishing, 2018

    Published in: Journal of Applied Physics

  6. Öttking, Rolf; Kupke, Steve; Nadimi, Ebrahim; Leitsmann, Roman; Lazarevic, Florian; Plänitz, Philipp; Roll, Guntrade; Slesazeck, Stefan; Trentzsch, Martin; Mikolajick, Thomas

    Defect generation and activation processes in HfO2thin films: Contributions to stress-induced leakage currents : Defect generation and activation processes in HfO<sub>2</sub>thin films

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    Wiley, 2015

    Published in: physica status solidi (a)

  7. Mulaosmanovic, Halid; Ocker, Johannes; Müller, Stefan; Schroeder, Uwe; Müller, Johannes; Polakowski, Patrick; Flachowsky, Stefan; van Bentum, Ralf; Mikolajick, Thomas; Slesazeck, Stefan

    Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors

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    American Chemical Society (ACS), 2017

    Published in: ACS Applied Materials & Interfaces

  8. Mikolajick, Thomas; Müller, Stefan; Schenk, Tony; Yurchuk, Ekaterina; Slesazeck, Stefan; Schröder, Uwe; Flachowsky, Stefan; van Bentum, Ralf; Kolodinski, Sabine; Polakowski, Patrick; Müller, Johannes

    Doped Hafnium Oxide – An Enabler for Ferroelectric Field Effect Transistors

    Conference Proceedings
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    Trans Tech Publications Ltd, 2014

    Published in: 6th Forum on New Materials - Part C

  9. Pešić, Milan; Künneth, Christopher; Hoffmann, Michael; Mulaosmanovic, Halid; Müller, Stefan; Breyer, Evelyn T.; Schroeder, Uwe; Kersch, Alfred; Mikolajick, Thomas; Slesazeck, Stefan

    A computational study of hafnia-based ferroelectric memories: from ab initio via physical modeling to circuit models of ferroelectric device

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    Springer Science and Business Media LLC, 2017

    Published in: Journal of Computational Electronics

  10. Yurchuk, Ekaterina; Muller, Johannes; Paul, Jan; Schlosser, Till; Martin, Dominik; Hoffmann, Raik; Mueller, Stefan; Slesazeck, Stefan; Schroeder, Uwe; Boschke, Roman; van Bentum, Ralf; Mikolajick, Thomas

    Impact of Scaling on the Performance of HfO2-Based Ferroelectric Field Effect Transistors

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    Institute of Electrical and Electronics Engineers (IEEE), 2014

    Published in: IEEE Transactions on Electron Devices