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  5. Supreeti, Shraddha [Author] ; Sinzinger, Stefan [Degree supervisor]; Hoffmann, Martin [Degree supervisor]; Strehle, Steffen [Degree supervisor] Technische Universität Ilmenau

    Soft nanoimprint lithography on curved surfaces

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    Ilmenau: Universitätsbibliothek, [2020?]

  6. Si, Shuhao [Author] ; Hoffmann, Martin [Degree supervisor]; Sinzinger, Stefan [Other]; Hillmer, Hartmut [Other]

    Soft UV nanoimprint lithography : concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch

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    Ilmenau: TU Ilmenau, 2018

  7. Handte, Thomas [Author]; Scheller, Nicolas [Author]; Dittrich, Lars [Author]; Thesen, Manuel W. [Author]; Messerschmidt, Martin [Author]; Sinzinger, Stefan [Author]

    Manufacturing of nanostructures with high aspect ratios using soft UV-nanoimprint lithography with bi- and trilayer resist systems

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    2022

    Published in: Micro and nano engineering ; 14(2022) vom: Apr., Artikel-ID 100106, Seite 1-7

  8. Si, Shuhao [Author] ; Hoffmann, Martin [Degree supervisor]; Sinzinger, Stefan [Other]; Hillmer, Hartmut [Other] Technische Universität Ilmenau

    Soft UV nanoimprint lithography : concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch

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    Ilmenau: Universitätsbibliothek, 11.06.2018

  9. Voisin, Pauline [Author]

    Next generation lithography by UV curing nanoimprint: study and development of materials and processes for the microelectronics industry application ; Lithographie de nouvelle génération par nanoimpression assistée par UV: étude et développement de matériaux et procédés pour l'application microélectronique

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    [Erscheinungsort nicht ermittelbar]: HAL CCSD, 2007

  10. Shibata, Mayuko; Horiba, Akira; Nagaoka, Yoshinori; Kawata, Hiroaki; Yasuda, Masaaki; Hirai, Yoshihiko

    Process-simulation system for UV-nanoimprint lithography

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    American Vacuum Society, 2010

    Published in: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

  15. De Girolamo, J.; Chouiki, M.; Tortai, J.-H.; Sourd, C.; Derrough, S.; Zelsmann, M.; Boussey, J.

    Epoxy silsesquioxane resists for UV nanoimprint lithography

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    American Vacuum Society, 2008

    Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

  19. Garidel, Sophie; Zelsmann, Marc; Chaix, Nicolas; Voisin, Pauline; Boussey, Jumana; Beaurain, Arnaud; Pelissier, Bernard

    Improved release strategy for UV nanoimprint lithography

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    American Vacuum Society, 2007

    Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena