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Kleefeldt, Klaus [Author]; Dammel, F. [Author]; Gabel, Klaus [Author]; Jordan, Thomas [Author]; Schmuck, I. [Author]

Safety and environmental impact of the dual coolant blanket concept : (SEAL subtask 6.2., final report)

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Karlsruhe: KIT-Bibliothek, [2017]

Published in: Forschungszentrum Karlsruhe: Wissenschaftliche Berichte des Forschungszentrums Karlsruhe ; 5764
Dammel, F.; Beer, H.

Numerische Simulation der Verdampfung eines Tropfens im Direkt-Kontakt

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Wiley, 2001

Published in: Chemie Ingenieur Technik, 73 (2001) 10, Seite 1294-1299
Dammel, F.; Beer, H.

Numerische Simulation der Verdampfung eines Tropfens im Direkt-Kontakt

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Wiley, 2001

Published in: Chemie Ingenieur Technik, 73 (2001) 10, Seite 1294-1299
Dammel, C S; Noller, H F

Suppression of a cold-sensitive mutation in 16S rRNA by overexpression of a novel ribosome-binding factor, RbfA

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Cold Spring Harbor Laboratory, 1995

Published in: Genes & Development, 9 (1995) 5, Seite 626-637
Dammel, C S; Noller, H F

A cold-sensitive mutation in 16S rRNA provides evidence for helical switching in ribosome assembly

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Cold Spring Harbor Laboratory, 1993

Published in: Genes & Development, 7 (1993) 4, Seite 660-670
Dammel, Joseph A.; Bielicki, Jeffrey M.; Pollak, Melisa F.; Wilson, Elizabeth J.

A Tale of Two Technologies: Hydraulic Fracturing and Geologic Carbon Sequestration

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American Chemical Society (ACS), 2011

Published in: Environmental Science & Technology, 45 (2011) 12, Seite 5075-5076
Mori, Hiro; Dammel, Carol; Becker, Elisa; Triman, Kathleen; Noller, Harry F.

Single base alterations upstream of the E. coli 16S rRNA coding region result in temperature-sensitive 16S rRNA expression

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Elsevier BV, 1990

Published in: Biochimica et Biophysica Acta (BBA) - Gene Structure and Expression, 1050 (1990) 1-3, Seite 323-327
Bijkerk, F.; van Dorssen, G.E.; van der Wiel, M.J.; Dammel, R.; Lingnau, J.

Laser plasma as X-ray source for lithographic imaging of submicron structures onto experimental X-ray resist

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Elsevier BV, 1989

Published in: Microelectronic Engineering, 9 (1989) 1-4, Seite 121-125
Dammel, R.; Dössel, K.-F.; Lingnau, J.; Theis, J.; Huber, H.; Oertel, H.; Trube, J.

Negative-tone high-resolution photocatalytic resist for x-ray lithography

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Elsevier BV, 1989

Published in: Microelectronic Engineering, 9 (1989) 1-4, Seite 575-578
Paulus, E. F.; Dammel, R.; Kämpf, G.; Wegener, P.; Siam, K.; Wolinski, K.; Schäfer, L.

Structure of 3,3'-dimethoxy-2,2'-bithiophene and comparison with quantum-mechanical calculations

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International Union of Crystallography (IUCr), 1988

Published in: Acta Crystallographica Section B Structural Science, 44 (1988) 5, Seite 509-512
Dammel, R.; Dössel, K.F.; Lingnau, J.; Theis, J.; Huber, H.L.; Oertel, H.

Photocatalytic novolak-based positive resist for X-ray lithography - kinetics and simulation -

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Elsevier BV, 1987

Published in: Microelectronic Engineering, 6 (1987) 1-4, Seite 503-509
Pollak, Melisa F.; Bielicki, Jeffrey M.; Dammel, Joseph A.; Wilson, Elizabeth J.; Fitts, Jeffrey P.; Peters, Catherine A.

The Leakage Impact Valuation (LIV) Method for Leakage from Geologic CO2 Storage Reservoirs

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Elsevier BV, 2013

Published in: Energy Procedia, 37 (2013), Seite 2819-2827
Martinez, C.S.; Martinez de Posadas, M.del C.; Liste, H.; Grassi, M.; Garrido, F.; Angelica, Dammel

5-09-05 Oculocutaneus albinism with deafness and Mobius face's like

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Elsevier BV, 1997

Published in: Journal of the Neurological Sciences, 150 (1997), Seite S290
Eakin, Ronald J.; Detweiler, Shangting F.; Stagaman, Gregory J.; Tesauro, Mark R.; Spak, Mark A.; Dammel, Ralph R.

Process effects resulting from an increased BARC thickness

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SPIE, 1997

Published in: SPIE Proceedings, 3049 (1997), Seite 397
Triman, Kathleen; Becker, Elisa; Dammel, Carol; Katz, John; Mori, Hiro; Douthwaite, Stephen; Yapijakis, Christos; Yoast, Sienna; Noller, Harry F.

Isolation of Temperature-sensitive Mutants of 16 S rRNA in Escherichia coli

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Elsevier BV, 1989

Published in: Journal of Molecular Biology, 209 (1989) 4, Seite 645-653
Schuetter, S.; Shedd, T.; Nellis, G.; Romano, A.; Dammel, R.; Padmanaban, M.; Houlihan, F.; Krawicz, A.; Lin, G.; Rahman, D.; Chakrapani, S.; Neisser, M.; Van Peski, C.

Effect of resist surface characteristics on film-pulling velocity in immersion lithography

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American Vacuum Society, 2006

Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 24 (2006) 6, Seite 2798-2802
Conley, Will; LeSuer, Robert J.; Fan, Frank F.; Bard, Allen J.; Taylor, Chris; Tsiartas, Pavlos; Willson, Grant; Romano, Andrew; Dammel, Ralph

Understanding the photoresist surface-liquid interface for ArF immersion lithography

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SPIE, 2005

Published in: SPIE Proceedings, 5753 (2005), Seite 64
Houlihan, Francis M.; Sakamuri, Raj; Romano, Andrew R.; Dammel, Ralph R.; Conley, Will; Rich, Georgia K.; Miller, Daniel; Rhodes, Larry F.; McDaniels, Joseph M.; Chang, Chun

Baking study of fluorinated 157-nm resist

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SPIE, 2003

Published in: SPIE Proceedings, 5039 (2003), Seite 641
Dammel, Ralph R.; Sakamuri, Raj; Lee, Sang-Ho; Rahman, Dalil; Kudo, Takanori; Romano, Andrew R.; Rhodes, Larry F.; Lipian, John-Henry; Hacker, Cheryl; Barnes, Dennis A.

Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

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SPIE, 2002

Published in: SPIE Proceedings, 4690 (2002), Seite 101
Abdallah, D. J.; McKenzie, D.; Timko, A.; Dioses, A.; Houlihan, F.; Rahman, D.; Miyazaki, S.; Zhang, R.; Kim, W.; Wu, H.; Pylneva, L.; Lu, P.-H.; Neisser, M.; Dammel, R. R.; Biafore, J. J.

Spin-on tri-layer approaches to high NA 193-nm lithography

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SPIE, 2007

Published in: SPIE Proceedings, 6519 (2007), Seite 65190M

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