Dammel, Ralph R.;
Sakamuri, Raj;
Lee, Sang-Ho;
Rahman, Dalil;
Kudo, Takanori;
Romano, Andrew R.;
Rhodes, Larry F.;
Lipian, John-Henry;
Hacker, Cheryl;
Barnes, Dennis A.
Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography
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Media type:
Electronic Conference Proceeding
Title:
Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography
Contributor:
Dammel, Ralph R.;
Sakamuri, Raj;
Lee, Sang-Ho;
Rahman, Dalil;
Kudo, Takanori;
Romano, Andrew R.;
Rhodes, Larry F.;
Lipian, John-Henry;
Hacker, Cheryl;
Barnes, Dennis A.
Published:
SPIE, 2002
Published in:
SPIE Proceedings, 4690 (2002), Seite 101