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Fogarassy, Eric [Editor] ; UVX 3 1996, UVX 3 1996

Les sources cohérentes et incohérentes UV, VUV et X : applications et développements récents

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Les Ulis: Éd. de Physique, 1997

Published in: Annales de physique / Colloque ; 1997,1 - Annales de physique ; 22,1/2,Suppl.
Castex, Marie-Claude [Editor] ; UVX 1 1992 Carry-le-Rouet, Centre national de la recherche scientifique, Frankreich Secrétariat Général de la Défense Nationale

Sources cohérentes et incohérentes VUV et XUV : applications et développements récents

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Les Ulis: Éd. de physique, 1992

Published in: Annales de physique / Colloque ; 1992,1 - Annales de physique ; 17,1,Suppl.
Moncorgé, Richard [Editor] ; UVX 8 2006 Colleville-sur-Mer

8e Colloque National sur les Sources Cohérentes et Incohérentes UV, VUV et X: Applications et Développements Récents : UVX 2006; VVF de Colleville-sur-Mer, France, 6 - 9 juin 2006

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Les Ulis: Éditions de Physique, 2006

Published in: Journal de physique ; 138
Delaporte, Philippe [Editor] ; UVX 5 2000 Porquerolles

UVX 2000 : 5e Colloque sur les Sources Cohérentes et Incohérentes UV, VUV et X; applications et développements récents; Îles de Porquerolles, France, 16 - 19 Mai 2000

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Les Ulis: Éditions de Physique, 2001

Published in: Journal de physique ; 11,7
Bachau, Henri [Editor] ; UVX 6 2002 Saint-Pierre-d'Oléron

UVX 2002 : 6e Colloque sur les Sources Cohérentes et Incohérentes UV, VUV et X; applications et développements récents; [Iles d' Oléron, Centre "La Vieille Perrotine", CAES du CNRS, France, 11 - 14 juin 2002]

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Les Ulis: Éditions de Physique, 2003

Published in: Journal de physique ; 108
Champeaux, C. [Editor] ; UVX 4 1998 Collonges-la-Rouge

UVX 98 : 4e Colloque sur les Sources cohérentes et incohérentes UV, VUV et X; applications et développements récents; Collonges-la-Rouge, 6 - 9 octobre 1998

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Les Ulis: Éditions de Physique, 1999

Published in: Journal de physique ; 9,5
Attwood, David T. [Author]

Soft x-rays and extreme ultraviolet radiation : principles and applications - [1. paperback version, digitally printed (with amendments)]

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Cambridge [u.a.]: Cambridge Univ. Press, 2007
Bakshi, Vivek [Editor]

EUV lithography

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Bellingham, Wash.: SPIE Press [u.a.], c 2009

Published in: SPIE: SPIE press monograph ; 17800
Ouerdane, Youcef [Editor] ; UVX 7 2004 Saint-Étienne

UVX 2004 : 7ième Colloque sur les Sources Cohérentes et Incohérentes UV, VUV et X - Applications et Développements Récents ; Centre des Congrès de Saint-Étienne, France, 7 - 11 juin 2004

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Les Ulis: Éditions de Physique, 2005

Published in: Journal de physique ; 12700
Wolff, Burkhard [Author]

Beobachtung von heißen weißen Zwergsternen im ultravioletten und extrem-ultravioletten Spektralbereich : photosphärische und interstellare Elementhäufigkeiten - [Als Ms. gedr.]

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Aachen: Shaker, 1999

Published in: Berichte aus der Astronomie
Freiberger, Ralf [Author] ; Rheinisch-Westfälische Technische Hochschule Aachen

Realisierung eines hochauflösenden EUV-Mikroskops mit einer optimierten Gasentladungsquelle zum Betrieb mit Wellenlängen um 17 nm zur Mikroskopie an M-Kanten von Elementen

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Aachen, 2017
Wieneke, Stephan [Author]

Optisch gepumptes z-Pinch-Plasma zur Erzeugung von Strahlung im Extrem-Ultravioletten Spektralbereich - [1. Aufl.]

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Clausthal-Zellerfeld: Papierflieger, 2008
Juha, Libor [Editor]; Bajt, Saša [Editor]; Soufli, Regina [Editor] ; Damage to VUV, EUV, and X-ray optics Veranstaltung 6. 2017 Prag, SPIE, SPIE

Damage to VUV, EUV, and X-Ray Optics VI : 24-25 April 2017, Prague, Czech Republic

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Bellingham, Washington, USA: SPIE, [2017]

Published in: SPIE: Proceedings of SPIE ; 10236
Juha, Libor [Editor]; Bajt, Saša [Editor]; London, Richard [Editor] ; Damage to VUV, EUV, and X-Ray Optics Veranstaltung 2015 Prag, SPIE, SPIE

Damage to VUV, EUV, and X-Ray Optics V : 15-16 April 2015, Prague, Czech Republic

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Bellingham, Washington, USA: SPIE, [2015]

Published in: SPIE: Proceedings of SPIE ; 9511
Paulus, Gerhard G. [Contributor]; Lötzsch, Robert [Contributor] ; Friedrich-Schiller-Universität Jena

Verbund: 05P2015 - APPA R&D : Schlussbericht : Förderzeitraum: 01.07.2015-31.12.2018

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[Jena]: Friedrich-Schiller-Universität Jena, 30.06.2019
Drescher, Markus [Contributor]; Roßbach, Jörg [Contributor]; Wieland, Marek [Contributor] ; Universität Hamburg

Verbund: 05K2016-LoKoFEL: Longitudinale Kohärenz am Freie-Elektronen-Laser – Kontrolle, Analyse und Anwendungen; Thema: Konzepte für das Erzeugen longitudinal kohärenter FELStrahlung für Anwendungen zum Studium phasensensitiver Prozesse : Schlussbericht : Förderzeitraum: 01.07.2016-31.12.2019

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[Hamburg]: Universität Hamburg, 24.06.2020
Levinson, Harry J. [Author]

Extreme ultraviolet lithography

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Bellingham: SPIE Press, [2020]

Published in: SPIE press monograph ; 326
Bakshi, Vivek [Editor]

EUV lithography - [Second edition]

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Bellingham, Washington, USA: SPIE Press, [2018]

Published in: SPIE press monograph ; 283
Bakshi, Vivek [Editor] ; SPIE

EUV lithography

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Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA): SPIE, [2009]

Published in: SPIE press monograph ; 178,onl
Tadesse, Getnet [Author] ; Limpert, Jens [Degree supervisor]; Eggeling, Christian [Degree supervisor]; Brocklesby, William S. [Degree supervisor] Friedrich-Schiller-Universität Jena

Nanoscale coherent diffractive imaging using high-harmonic XUV sources

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Jena, [2019?]

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