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Stauffenberg, Jaqueline [Author]; Ortlepp, Ingo [Author]; Reuter, Christoph [Author]; Holz, Mathias [Author]; Dontsov, Denis [Author]; Schäffel, Christoph [Author]; Strehle, Steffen [Author]; Zöllner, Jens-Peter [Author]; Rangelow, Ivo W. [Author]; Manske, Eberhard [Author]

Investigations on long-range AFM scans using a nanofabrication machine (NFM-100)

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  • Media type: E-Article
  • Title: Investigations on long-range AFM scans using a nanofabrication machine (NFM-100)
  • Contributor: Stauffenberg, Jaqueline [Author]; Ortlepp, Ingo [Author]; Reuter, Christoph [Author]; Holz, Mathias [Author]; Dontsov, Denis [Author]; Schäffel, Christoph [Author]; Strehle, Steffen [Author]; Zöllner, Jens-Peter [Author]; Rangelow, Ivo W. [Author]; Manske, Eberhard [Author]
  • Published: 2020
  • Published in: Proceedings ; Volume 56 (2020), issue 1, 34, Seite 1-3
  • Language: English
  • DOI: 10.3390/proceedings2020056034
  • Identifier:
  • Origination:
  • Footnote:
  • Description: The focus of this work lies on investigations on a new Nano Fabrication Machine (NFM-100) with a mounted atomic force microscope (AFM). This installed tip-based measuring system uses self-sensing and self-actuated microcantilevers, which can be used especially for field-emission scanning probe lithography (FESPL). The NFM-100 has a positioning range of Ø 100 mm, which offers, in combination with the tip-based measuring system, the possibility to analyse structures over long ranges. Using different gratings, the accuracy and the reproducibility of the NFM-100 and the AFM-system will be shown.
  • Access State: Open Access
  • Rights information: Attribution (CC BY)