• Media type: E-Book
  • Title: Patent Law, Appropriability, and External R&D : Empirical Evidence
  • Contributor: Hou, Yun [VerfasserIn]; Png, Ivan P. L. [VerfasserIn]; Xiong, Xi [VerfasserIn]
  • imprint: [S.l.]: SSRN, [2021]
  • Extent: 1 Online-Ressource (44 p)
  • Language: English
  • DOI: 10.2139/ssrn.3029106
  • Identifier:
  • Origination:
  • Footnote: Nach Informationen von SSRN wurde die ursprüngliche Fassung des Dokuments August 30, 2020 erstellt
  • Description: Theoretically, whether technology firms should increase external R&D in response to stronger patent law depends on the effects of law on returns to external and internal R&D. Exploiting geographical differences in the strengthening of patent protection due to the U.S. Court of Appeals for the Federal Circuit, we find that, on average, external R&D increased by 42.3 percent. The effect was more pronounced among companies less intensive in manufacturing, smaller in scope, and in complex-technology and more geographically concentrated industries, and those where patents were less effective in appropriability
  • Access State: Open Access