Description:
The Response Surface Methodology was employed to optimize the leaching parameters for SiO2 during NaOH alkaline leaching from vanadium acid leaching residues. The kinetic aspect of the process was also investigated. The results illustrate that each factor positively influences the SiO2 leaching rate, with the significance of these factors ranking as follows: leaching temperature > alkali residue mass ratio > leaching duration. Under these optimal circumstances, the SiO2 leaching rate can attain a value as high as 95.55%. A kinetic examination of the alkaline leaching process implies that the reaction process is predominantly governed by internal diffusion. The apparent activation energy of the reaction is 11.44 kJ·mol–1. The kinetic equation is: [[EQUATION]],and the reaction order of NaOH is 0.69294