• Media type: Book
  • Title: Silicon technologies : ion implantation and thermal treatment
  • Contributor: Baudrant, Annie [Hrsg.]
  • imprint: Hoboken, NJ: Wiley, 2011
    London: ISTE [u.a.], 2011
  • Extent: XVII, 337 S.; Ill., graph. Darst; 24 cm
  • Language: English
  • ISBN: 1848212313; 9781848212312
  • RVK notation: ZN 4100 : Allgemeines
  • Keywords: Semiconductor doping ; Ion implantation ; Semiconductors Heat treatment
  • Origination:
  • Footnote: Includes bibliographical references and index
  • Description: The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion

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  • Status: Loanable