• Media type: Text; Doctoral Thesis; Electronic Thesis; E-Book
  • Title: Optimization of epitaxial graphene growth for quantum metrology
  • Contributor: Momeni Pakdehi, Davood [Author]
  • Published: Hannover : Institutionelles Repositorium der Leibniz Universität Hannover, 2020
  • Issue: published Version
  • Language: English
  • DOI: https://doi.org/10.15488/10201
  • Keywords: Polarization doping ; Wachstum des epitaktischen Graphens ; polymer-assisted sublimation growth ; epitaxial graphene growth ; argon flow-rate ; resistance anisotropy ; silicon carbide ; Siliciumcarbid ; Stacking-order ; Widerstandsanisotropie ; homogenous quasi-freestanding graphene ; Argon-Flussrate ; homogenes quasi-freistehendes Graphen ; SiC ; Quantum resistance metrology
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  • Description: The electrical quantum standards have played a decisive role in modern metrology, particularly since the introduction of the revised International System of Units (SI) in May 2019. By adapting the basic units to exactly defined natural constants, the quantized Hall resistance (QHR) standards are also given precisely. The Von Klitzing constant RK = h/e2 (h Planck's constant and e elementary charge) can be measured precisely using the quantum Hall effect (QHE) and is thus the primary representation of the ohm. Currently, the QHR standard based on GaAs/AlGaAs heterostructure has succeeded in yielding robust resistance measurements with high accuracy <10−9. In recent years, graphene has been vastly investigated due to its potential in QHR metrology. This single-layer hexagonal carbon crystal forms a two-dimensional electron gas system and exhibits the QHE, due to its properties, even at higher temperatures. Thereby, in the future the QHR standards could be realized in more simplified experimental conditions that can be used at higher temperatures and currents as well as smaller magnetic fields than is feasible in conventional GaAs/AlGaAs QHR. The quality of the graphene is of significant importance to the QHR standards application. The epitaxial graphene growth on silicon carbide (SiC) offers decisive advantages among the known fabrication methods. It enables the production of large-area graphene layers that are already electron-doped and do not have to be transferred to another substrate. However, there are fundamental challenges in epitaxial graphene growth. During the high-temperature growth process, the steps on the SiC surface bunch together and form terraces with high steps. This so-called step-bunching gives rise to the graphene thickness inhomogeneity (e.g., the bilayer formation) and extrinsic resistance anisotropy, which both deteriorate the performance of electronic devices made from it. In this thesis, the process conditions of the epitaxial graphene growth through a so-called polymer-assisted ...
  • Access State: Open Access
  • Rights information: Attribution (CC BY)