• Media type: Text; E-Article
  • Title: Magnetron sputter deposition of Ta2O5-SiO2 quantized nanolaminates
  • Contributor: Schwyn Thöny, S. [Author]; Bärtschi, M. [Author]; Batzer, M. [Author]; Baselgia, M. [Author]; Waldner, S. [Author]; Steinecke, M. [Author]; Badorreck, H. [Author]; Wienke, A. [Author]; Jupé, M. [Author]
  • Published: Washington, DC : Optica, 2023
  • Published in: Optics Express 31 (2023), Nr. 10 ; Optics Express
  • Issue: published Version
  • Language: English
  • DOI: https://doi.org/10.15488/16414; https://doi.org/10.1364/oe.487892
  • Keywords: Silicon ; Optical materials ; Atomic layer deposition ; Deposition process ; Silica ; Atomic-layer deposition ; Optical coatings ; Magnetron-sputtering ; Magnetron sputtering ; Tantalum oxides ; Nano-laminates ; Ion beams ; Materials characterization ; Ion-beam-sputtering ; Magnetron sputter deposition ; Optical metamaterials ; Optical interference coatings ; Parameter range
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  • Description: Quantized nanolaminates are a type of optical metamaterials, which were discovered only recently. Their feasibility was demonstrated by atomic layer deposition and ion beam sputtering so far. In this paper, we will report on the successful magnetron sputter deposition of quantized nanolaminates based on Ta2O5-SiO2. We will describe the deposition process, show results and material characterization of films deposited in a very wide parameter range. Furthermore, we will show how quantized nanolaminates deposited by magnetron sputtering were used in optical interference coatings such as antireflection and mirror coatings.
  • Access State: Open Access