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Media type:
E-Article
Title:
Impact of Laser Treatment on Hydrogenated Amorphous Silicon Properties
Contributor:
Maurer, Claudia
[Author];
Beyer, Wolfhard
[Author];
Hülsbeck, Markus
[Author];
Breuer, Uwe
[Author];
Rau, Uwe
[Author];
Haas, Stefan
[Author]
Published:
Deutsche Gesellschaft für Materialkunde, 2020
Published in:Advanced engineering materials 22(6), 1901437 (2020). doi:10.1002/adem.201901437
Language:
English
DOI:
https://doi.org/10.1002/adem.201901437
ISSN:
1438-1656;
1527-2648
Origination:
Footnote:
Diese Datenquelle enthält auch Bestandsnachweise, die nicht zu einem Volltext führen.
Description:
Herein, the application of laser radiation to locally modify the hydrogen distribution within hydrogenated amorphous silicon films on a short time scale is studied. The impact of laser power and irradiation time on the temperature of the silicon layer during the laser treatment and the hydrogen outdiffusion is analyzed. Moreover, the resulting optoelectronic properties of the amorphous silicon are examined. On a timescale of a few seconds or less, the hydrogen concentration in the near‐surface region of the silicon layer can be successfully decreased without major impact on the optoelectronic properties.